肖特基势垒
整改
量子点
金属半导体结
材料科学
光电子学
肖特基二极管
泄漏(经济)
接受者
纳米技术
凝聚态物理
电压
电气工程
物理
二极管
经济
宏观经济学
工程类
作者
Jason Clifford,Keith W. Johnston,Larissa Levina,Edward H. Sargent
摘要
We elucidate experimentally a quantitative physical picture of the Schottky barrier formed at the junction between a metallic contact and a semiconducting colloidal quantum dot film. We used a combination of capacitance-voltage and temperature-dependent current-voltage measurements to extract the key parameters of the junction. Three differently processed Al∕PbS colloidal quantum dot junction devices provide rectification ratios of 104, ideality factors of 1.3, and minimal leakage currents at room temperature. The Schottky barrier height is 0.4eV and the built-in potential 0.3V. The depletion width ranges from 90to150nm and the acceptor density ranges from 2×1016to7×1016cm−3.
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