声子
晶体管
弹道传导
非平衡态热力学
硅
材料科学
热传导
基质(水族馆)
电子
纳米尺度
凝聚态物理
光电子学
纳米电子学
纳米技术
工程物理
物理
电压
量子力学
复合材料
地质学
海洋学
作者
Jeremy Rowlette,Kenneth E. Goodson
标识
DOI:10.1109/ted.2007.911043
摘要
Heat conduction from transistors and interconnects is a critical design consideration for computing below the 20-nm milestone. This paper reviews detailed heat generation and transport mechanisms in silicon devices with a focus on the nonequilibrium behavior of electrons and phonons. Fully coupled and self-consistent ballistic phonon and electron simulations are developed in order to examine the departure from equilibrium within the phonon system and its relevance for properly simulating the electrical behavior of devices. We illustrate the manner in which nanoscale-transport phenomena are critically important for a broad variety of low-dimensional silicon-based devices, including FinFETs and depleted substrate transistors.
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