材料科学
降级(电信)
涂层
辐照
光学
光学涂层
复合材料
计算机科学
物理
电信
核物理学
作者
Alexandre Gatto,Ludovic Escoubas,P. Roche,Mireille Commandré
标识
DOI:10.1016/s0030-4018(97)00651-2
摘要
The radiation induced degradation of optical glass substrates during thin film deposition, which has been shown previously, is studied using simulation. Influence of UV irradiation by spectral lamps and excimer laser on fused silica and borosilicate glasses is investigated. Photothermal deflection is used to measure the increase in BK7 absorption versus time during UV irradiation. We also study means permitting a curing of UV induced absorption: first thermal annealing, and second focusing a visible laser beam onto the irradiated area. The results show that UV radiation can be responsible for an important part of substrate absorption increase while coating.
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