Temperature-dependence of magnetron sputtered NiFe films: Structure, morphology, optical, electrical and OER catalytic properties

The NiFe films were fabricated on p-type Si, SiO2, SrTiO3 (STO) and Ni foam (NF) substrates to evaluate the structure, morphology, optical, electrical, and catalytic properties of the films fabricated by the direct current (DC) magnetron sputtering (MS) method at different temperatures. The microstructure, morphology, composition, optical, electrical and oxygen evolution reaction (OER) catalytic properties show a strong temperature dependence. The film has a larger absorption 0.575, higher band gap 2.15 eV at larger temperature, better conductivity with the sheet resistance 2.15 Ω/sq at higher temperature, and reaching lower overpotential 290 mV at the current density of 10 mA/cm2, which indicate that the prepared NiFe films are expected to be a candidate for optical, electrical devices and catalysts.