Rapid Thermal Annealing Process Toward Enhancement of ITO Thin Films

Indium tin oxide (ITO) thin films with 100 nm thickness were successfully deposited on soda-lime glass substrates by metal oxide electron beam evaporation at room temperature. The deposited films were post annealed via rapid thermal processor (RTP) in vacuum environment at 400 to 550 °C. All deposited ITO thin films were studied on the structural, electrical, and optical properties. Results showed that the post annealing treatment by RTP improved the crystallinity, increased crystallite size, and increased surface roughness values. Higher RTP post annealing temperature also enhanced the electrical performance that led to higher transmittance of ITO thin films.