High‐Performance Perovskite Flat Panel X‐Ray Imagers via Blade Coating

Abstract Perovskite X‐ray detectors are recognized as the most promising candidates for low‐dose detectors due to their superior performance. However, it is still full of challenging in the fabrication of flat‐panel X‐ray imagers (FPXIs), primarily due to the absence of large area thick films that exhibit high uniformity and long‐term performance stability. A general synthesis route is urgently needed to grow large‐scale halide perovskite thick films directly on a pixeled thin‐film transistor (TFT) backplane with high uniformity, closing the gap between the great potential of perovskite X‐ray detectors and their entry into the market. In this work, an advanced precursor paste suitable for blade coating is developed to enable high‐throughput manufacturing of FPXIs. Highly uniform perovskite films with a thickness of 300‐micrometers are directly deposited onto pixeled TFT substrates by the blade‐coating method using the above paste, which governs a stable dark current and minimal noise of the X‐ray detectors. As a result, (BA) 2 (MA) 9 Pb 10 I 31 perovskite X‐ray detectors achieved a high sensitivity of 15200 µC Gy air −1 cm −2 and a limit of detection (LoD) of 26.8 nGy air s −1 . Moreover, FPXIs with a spatial resolution of 0.95 lp mm −1 (0.475 lp pixel −1 ) are obtained, which exhibits negligible signal crosstalk and excellent X‐ray imaging performance.