光学
探测器
极紫外光刻
波前
帧速率
物理
材料科学
光电子学
作者
Wilhelm Eschen,Chang Liu,Daniel Penagos Molina,Robert Klas,Jens Limpert,Jan Rothhardt
出处
期刊:Optics Express
[The Optical Society]
日期:2023-04-14
卷期号:31 (9): 14212-14212
被引量:3
摘要
We present high-speed and wide-field EUV ptychography at 13.5 nm wavelength using a table-top high-order harmonic source. Compared to previous measurements, the total measurement time is significantly reduced by up to a factor of five by employing a scientific complementary metal oxide semiconductor (sCMOS) detector that is combined with an optimized multilayer mirror configuration. The fast frame rate of the sCMOS detector enables wide-field imaging with a field of view of 100 µm × 100 µm with an imaging speed of 4.6 Mpix/h. Furthermore, fast EUV wavefront characterization is employed using a combination of the sCMOS detector with orthogonal probe relaxation.
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