光学
栅栏
蚀刻(微加工)
材料科学
闪耀光栅
衍射光栅
梁(结构)
光刻胶
光电子学
物理
纳米技术
图层(电子)
作者
Di Zhang,Xinyu Mao,Lijiang Zeng
出处
期刊:Applied Optics
[The Optical Society]
日期:2022-11-16
卷期号:61 (33): 9972-9972
摘要
A twice oblique ion beam etching method is proposed to fabricate triangular blazed gratings that have controllable both blaze angle and anti-blaze angle. The anti-blaze angle is controlled by first obliquely etching the photoresist mask to obtain an asymmetrical trapezoidal grating, one sidewall of which then evolves into the anti-blaze facet in the second etch step. The blaze angle is controlled by obliquely etching the asymmetrical trapezoidal grating to obtain a triangular blazed grating. We show the key process steps of the method by fabricating a blazed grating with the blaze angle of 20.9° and the anti-blaze angle of 89.0°. The method is verified not only to increase the anti-blaze angle to near 90°, but also have a good tolerance against over-etching.
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