结晶度
钝化
材料科学
钙钛矿(结构)
铁电性
退火(玻璃)
卤化物
涂层
化学工程
氧化物
极化(电化学)
纳米技术
矿物学
图层(电子)
无机化学
光电子学
复合材料
冶金
化学
电介质
物理化学
工程类
作者
Hao Meng,Bingbing Chen,Xiuhong Dai,Jianxin Guo,Wenheng Li,Yuhua Bai,Xuan Chang,Xuning Zhang,Jingwei Chen,Qing Gao,Baoting Liu,Jianhui Chen
标识
DOI:10.1002/advs.202400174
摘要
Abstract Perovskite oxides and organic–inorganic halide perovskite materials, with numerous fascinating features, have been subjected to extensive studies. Most of the properties of perovskite materials are dependence on their ferroelectricity that denoted by remanent polarization ( P r ). Thus, the increase of P r in perovskite films is mainly an effort in material physics. At present, commonplace improvement schemes, i.e., controlling material crystallinity, and post‐annealing by using a high‐temperature process, are normally used. However, a simpler and temporal strategy for P r improvement is always unavailable to perovskite material researchers. In this study, an organic coating layer, low‐temperature, and vacuum‐free strategy is proposed to improve the P r , directly increasing the P r from 36 to 56 µC cm −2 . Further study finds that the increased P r originates from the suppression of the oxygen defects and Ti defects. This organic coating layer strategy for passivating the defects may open a new way for the preparation of higher‐performance and cost‐effective perovskite products, further improving its prospective for application in the electron devices field.
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