TiO2 photocatalyst deposition by MOCVD on activated carbon

Activated carbon modified by HNO3 was used as the support during the production of TiO2 by metal organic chemical vapor deposition (MOCVD). The HNO3 modification increased mesopores surface area of activated carbon indicating the size of pores increased. The concentration of surface oxygen bearing groups on the HNO3 modified activated carbon was much higher than that of the original activated carbon. It was found that a modification of activated carbon by 6 mol/L HNO3 increased the deposition rate of TiO2 by 4.5 times. The modification of activated carbon by HNO3 significantly raised the photocatalytic activity of TiO2 resulting from the formation of smaller-sized TiO2 particles well dispersed confirmed by the results of XRD patterns and N2 adsorption–desorption isotherms.