X射线光电子能谱
薄膜
带隙
材料科学
俄歇电子能谱
扫描电子显微镜
异质结
分析化学(期刊)
沉积(地质)
化学浴沉积
光电子学
纳米技术
化学工程
化学
复合材料
古生物学
物理
色谱法
沉积物
核物理学
工程类
生物
作者
Ashraf Abdel Haleem,M. Ichimura
标识
DOI:10.1143/jjap.48.035506
摘要
A wide band gap InS-based thin film was deposited onto F-doped SnO2-coated glass by electrochemical deposition from an aqueous solution using a two-step periodic-pulse voltage. The film was characterized optically by a double beam spectrometer, morphologically by a scanning electron microscope. In addition, the composition ratios of the film were measured by Auger electron spectroscopy. Furthermore, the photosensitivity of the film was observed by means of photoelectrochemical measurements, which confirmed that the film showed n-type conduction. Finally, a detailed X-ray photoelectron spectroscopy (XPS) study was performed in order to understand the chemical states of the elements involved in the film composition. The XPS results revealed that the deposited film can be written in the form of InSxOy(OH)z. The film was used along with tin sulfide thin film to fabricate a novel heterojunction.
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