跨导
截止频率
材料科学
电子迁移率
晶体管
光电子学
散射
电容
极高频率
高电子迁移率晶体管
散射参数
切断
表面光洁度
表面粗糙度
光学
化学
物理
复合材料
电压
物理化学
量子力学
电极
作者
Jiangfeng Du,Hui Yan,Chenggong Yin,Zhihong Feng,Shaobo Dun,Qi Yu
摘要
A gate length of 0.2 μm InAlN/GaN high electron mobility transistor on SiC substrate is obtained with a maximum current gain cutoff frequency (fT) of 65.8 GHz and a maximum power gain cutoff frequency (fmax) of 143.6 GHz. Lombardi model, which takes interface roughness scattering into consideration, has been introduced to model the transconductance (gm) degradation. The simulated gm and fT with Lombardi model are 69% and 58% lower than the ones without considering interface roughness scattering, respectively. Further analysis show experimental gm, gate capacitance (Cg), and fT are consistent with results based on Lombardi model.
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