极端紫外线
极紫外光刻
紫外线
吸附
十四烷
碳纤维
污染
分压
辐射
化学
环境科学
材料科学
化学物理
环境化学
纳米技术
光学
光电子学
物理
物理化学
复合材料
有机化学
生态学
激光器
复合数
氧气
生物
作者
Shannon B. Hill,C. Tarrio,Robert F. Berg,T. B. Lucatorto
出处
期刊:Journal of vacuum science & technology
[American Vacuum Society]
日期:2020-09-11
卷期号:38 (6)
被引量:3
摘要
Carbon contamination induced by ultraviolet (UV) radiation affects precision optics in applications as diverse as semiconductor lithography and satellite observations of the Sun. Our previous experiments have shown that low-intensity UV-induced surface contamination depends quasilogarithmically on the partial pressure of the organic contaminant due to the polydispersive nature of the surface-adsorbate system. This complex dependence presents difficulties because, without a physically motivated model, it cannot be extrapolated to low pressures. We present measurements and a model of carbon growth induced by UV exposure in the presence of tetradecane vapor. The model, which includes a coverage-dependent adsorption energy, describes the measurements over four orders of magnitude in pressure, and we expect that it can be extrapolated to the lower pressures of interest to the extreme ultraviolet lithography and solar astronomy communities. Our experience with other contaminants leads us to expect that other organic contaminants will behave similar to tetradecane. The results also provide insights into the kinetics governing coverage isotherms at extremely low partial pressures.
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