透射电子显微镜
分辨率(逻辑)
高分辨率透射电子显微镜
电子显微镜
材料科学
能量过滤透射电子显微镜
传输(电信)
常规透射电子显微镜
电子
扫描共焦电子显微镜
光学
电子断层摄影术
扫描透射电子显微镜
物理
纳米技术
计算机科学
人工智能
核物理学
电信
作者
Eduardo Ortega,Niels de Jonge
标识
DOI:10.1017/s1431927620017365
摘要
Transmission electron microscopy (TEM) has played a canonical role to study the structure of materials and biochemical processes at the nanoscale.However, an unfortunate trade-off for the achievable resolution is the high electron dosage exerted into the specimen.High radiation dose has detrimental consequences for sensitive samples.Catalysts, zeolites, and many other macromolecules can only preserve their structures below a 100 ē/Ų threshold [1].In TEM, the spatial resolution is limited by the ratio of electrons available for detection, the energy spread of the electron source, and the broadening of the electron beam due to electron scattering.These components depend on the electron optics of the TEM instrument, the type of sample support, and the sample itself.Theoretical approaches to determine the dose-limited resolution are found elsewhere [2,3].Our aim in this subject is to demonstrate the capabilities of those models to predict and comprehend the origins of resolution loss under standard TEM acquisition conditions.
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