纳米光刻
纳米技术
材料科学
纳米光子学
纳米结构
平版印刷术
制作
光电子学
医学
病理
替代医学
作者
Xu A. Zhang,I‐Te Chen,Chih‐Hao Chang
出处
期刊:Nanotechnology
[IOP Publishing]
日期:2019-05-17
卷期号:30 (35): 352002-352002
被引量:54
标识
DOI:10.1088/1361-6528/ab2282
摘要
The advance of nanotechnology is firmly rooted in the development of cost-effective, versatile, and easily accessible nanofabrication techniques. The ability to pattern complex two-dimensional and three-dimensional nanostructured materials are particularly desirable, since they can have novel physical properties that are not found in bulk materials. This review article will report recent progress in utilizing self-assembly of colloidal particles for nanolithography. In these techniques, the near-field interactions of light and colloids are the sole mechanisms employed to generate the intensity distributions for patterning. Based on both 'bottom-up' self-assembly and 'top-down' lithography approaches, these processes are highly versatile and can take advantage of a number of optical effects, allowing the complex 3D nanostructures to be patterned using single exposures. There are several key advantages including low equipment cost, facile structure design, and patterning scalability, which will be discussed in detail. We will outline the underlying optical effects, review the geometries that can be fabricated, discuss key limitations, and highlight potential applications in nanophotonics, optoelectronic devices, and nanoarchitectured materials.
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