Deposition and characterization of alpha alumina thin films prepared by chemical bath deposition

Alpha alumina thin film has been deposited on glass substrate by simple chemical bath deposition technique at 60 °C. The structure and the crystallinity of the alpha alumina thin film were determined by X-ray diffraction and the grain size calculated from X-ray diffraction was 85 nm. The optical band gap of the film measured from UV–visible spectroscopy was 4.5 eV. The surface morphology of the film was traced by scanning electron microscopy and photoluminescence spectrum of the film shows that the presence of oxygen vacancies.