哈夫尼亚
矫顽力
铁电性
兴奋剂
还原(数学)
材料科学
领域(数学)
凝聚态物理
光电子学
物理
复合材料
数学
几何学
电介质
立方氧化锆
陶瓷
纯数学
作者
Tianyuan Zhu,Liyang Ma,Xu Duan,Shi Liu
出处
期刊:Cornell University - arXiv
日期:2024-07-03
标识
DOI:10.48550/arxiv.2407.02808
摘要
Hafnia-based ferroelectrics hold promise for nonvolatile ferroelectric memory devices. However, the high coercive field required for polarization switching remains a prime obstacle to their practical applications. A notable reduction in coercive field has been achieved in ferroelectric Hf(Zr)$_{1+x}$O$_2$ films with interstitial Hf(Zr) dopants [Science 381, 558 (2023)], suggesting a less-explored strategy for coercive field optimization. Supported by density functional theory calculations, we demonstrate the $Pca2_1$ phase, with a moderate concentration of interstitial Hf dopants, serves as a minimal model to explain the experimental observations, rather than the originally assumed rhombohedral phase. Large-scale deep potential molecular dynamics simulations suggest that interstitial defects promote the polarization reversal by facilitating $Pbcn$-like mobile 180$^\circ$ domain walls. A simple pre-poling treatment could reduce the switching field to less than 1 MV/cm and enable switching on a subnanosecond timescale. High-throughput calculations reveal a negative correlation between the switching barrier and dopant size and identify a few promising interstitial dopants for coercive field reduction.
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