硫醇
劈理（地质）
化学
保护组
功能群
碱金属
群（周期表）
光化学
有机化学
组合化学
材料科学
聚合物
断裂（地质）
复合材料
烷基
作者
Hongpeng Yang,Lei Chen,Shouguo Zhang,Gang Wang,Tingting Chen,Jing Xu,Tao Peng,Lin Wang,Liming Hu
标识
DOI：10.1002/slct.202201049
摘要
Abstract We successfully designed and synthesized a photolabile protecting group (PLPG) for thiol that can be rapidly photolyzed by irradiation at 365 nm to release thiol groups within 100 s. The photolytic reaction has mild conditions and avoids acid cleavage, leading to good yields with no side reactions as validated by HPLC. The PLPG has good acid/alkali tolerance
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