母线
材料科学
共发射极
光电子学
接触电阻
电阻式触摸屏
硅
等效串联电阻
电气工程
电压
电子工程
工程类
纳米技术
图层(电子)
作者
Harrison Wilterdink,R.A. Sinton,Adrienne L. Blum,Karoline Dapprich,Nick Degenhart,Wes Dobson
标识
DOI:10.1109/pvsc48320.2023.10359874
摘要
We demonstrate a new tool capable of performing nearly contactless current-voltage (I-V) and efficiency measurements for binning in silicon solar cell production lines. We validate the technique against conventional test methods for over 400 cells representing a range of technologies including 5-busbar passivated emitter rear contact (PERC), 5-busbar heterojunction technology (HJT), and both 9-busbar and 16-busbar tunnel oxide passivated contact (TOPCon). The tool leverages a wide variety of metrology techniques including Suns-Voc, light I-V, dark I-V, and a series resistance (Rs) analysis based on a single photoluminescence (PL) image. The Rs analysis reports multiple key resistive loss components including grid/finger loss (Rgrid) as well as the combined effect of emitter and contact loss (Rcontact). The technique is designed especially for present and future cell concepts (e.g. “multi-busbar” and “busbarless” cells) that use minimal silver and are thus difficult to electrically probe for standard I-V characterization.
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