期刊:IEEE Electron Device Letters [Institute of Electrical and Electronics Engineers] 日期:2023-01-09卷期号:44 (3): 532-535被引量:18
标识
DOI:10.1109/led.2023.3234690
摘要
With the development of bioelectronics, brain-inspired artificial synapses become more and more important. To simulate artificial synapse, a HfAlO ferroelectric tunnel junction (FTJ) was fabricated, which can simulate short-term synaptic plasticity for neuromorphic computing. The devices realize the synaptic function with low power consumption of about 7.15 aJ per synaptic event. Moreover, to explore the effect of oxygen defects on ferroelectric properties of HfAlO-based device, the first-principle analysis was further carried out. These results pave the way of hafnium-based ferroelectric synaptic devices.