Laser Interference Lithography—A Method for the Fabrication of Controlled Periodic Structures

材料科学 干涉光刻 制作 光学 平版印刷术 干扰(通信) 激光器 纳米技术 光电子学 计算机科学 计算机网络 医学 物理 频道(广播) 病理 替代医学
作者
Ri Liu,Liang Cao,Dongdong Liu,Lu Wang,Sadaf Saeed,Zuobin Wang
出处
期刊:Nanomaterials [MDPI AG]
卷期号:13 (12): 1818-1818 被引量:14
标识
DOI:10.3390/nano13121818
摘要

A microstructure determines macro functionality. A controlled periodic structure gives the surface specific functions such as controlled structural color, wettability, anti-icing/frosting, friction reduction, and hardness enhancement. Currently, there are a variety of controllable periodic structures that can be produced. Laser interference lithography (LIL) is a technique that allows for the simple, flexible, and rapid fabrication of high-resolution periodic structures over large areas without the use of masks. Different interference conditions can produce a wide range of light fields. When an LIL system is used to expose the substrate, a variety of periodic textured structures, such as periodic nanoparticles, dot arrays, hole arrays, and stripes, can be produced. The LIL technique can be used not only on flat substrates, but also on curved or partially curved substrates, taking advantage of the large depth of focus. This paper reviews the principles of LIL and discusses how the parameters, such as spatial angle, angle of incidence, wavelength, and polarization state, affect the interference light field. Applications of LIL for functional surface fabrication, such as anti-reflection, controlled structural color, surface-enhanced Raman scattering (SERS), friction reduction, superhydrophobicity, and biocellular modulation, are also presented. Finally, we present some of the challenges and problems in LIL and its applications.
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