材料科学
电介质
电容感应
电容器
制作
聚合物
纳米技术
光电子学
数码产品
可扩展性
吞吐量
复合材料
电气工程
计算机科学
电压
电信
工程类
病理
数据库
替代医学
医学
无线
作者
Yao Zhou,Qi Li,Bin Dang,Yang Yang,Tao Shao,He Li,Jun Hu,Rong Zeng,Jinliang He,Qing Wang
标识
DOI:10.1002/adma.201805672
摘要
Abstract High‐temperature capability is critical for polymer dielectrics in the next‐generation capacitors demanded in harsh‐environment electronics and electrical‐power applications. It is well recognized that the energy‐storage capabilities of dielectrics are degraded drastically with increasing temperature due to the exponential increase of conduction loss. Here, a general and scalable method to enable significant improvement of the high‐temperature capacitive performance of the current polymer dielectrics is reported. The high‐temperature capacitive properties in terms of discharged energy density and the charge–discharge efficiency of the polymer films coated with SiO 2 via plasma‐enhanced chemical vapor deposition significantly outperform the neat polymers and rival or surpass the state‐of‐the‐art high‐temperature polymer nanocomposites that are prepared by tedious and low‐throughput methods. Moreover, the surface modification of the dielectric films is carried out in conjunction with fast‐throughput roll‐to‐roll processing under ambient conditions. The entire fabrication process neither involves any toxic chemicals nor generates any hazardous by‐products. The integration of excellent performance, versatility, high productivity, low cost, and environmental friendliness in the present method offers an unprecedented opportunity for the development of scalable high‐temperature polymer dielectrics.
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