扩散
透射电子显微镜
合金
活化能
结晶学
扫描电子显微镜
相(物质)
材料科学
动力学
扫描透射电子显微镜
离子键合
动能
分析化学(期刊)
化学
离子
热力学
纳米技术
物理化学
冶金
物理
复合材料
有机化学
色谱法
量子力学
作者
Esmaeil Adabifiroozjaei,Pramod Koshy,Fahimeh Emadi,Sajjad S. Mofarah,Hongyang Ma,Ebad Rastkerdar,Sean Lim,Richard F. Webster,David R. G. Mitchell,Charles C. Sorrell
摘要
Abstract Al‐Si 3 N 4 couples were heat‐treated at 850‐1150°C for 250 hours. The thickness of the interacted area was measured by scanning electron microscopy (SEM) and scanning/transmission electron microscopy (TEM/STEM). The interaction rate increases exponentially with inverse temperature, with an activation energy of 194.23 kJ/mol and diffusion pre‐coefficient of 5 × 10 −9 m 2 /s, indicating that the interaction is diffusion‐dependent. As the results showed, the interfacial area is comprised of Al alloy channels, Si precipitates, and AlN grains. Al‐Si transfer through the solid solution (Si 3‐x Al x N 4‐y ) at the interface of Al alloy and β‐Si 3 N 4 grains controls the kinetic of the interaction. When concentration of Al in solid solution exceeds a certain amount, it undergoes a topotactic phase transformation to form Al 1‐x Si x N 1+y ( viz ., AlN). Next, the Al 1‐x Si x N 1+y grains detach from the β‐Si 3 N 4 grains and subsequently new Al‐Si 3 N 4 interfaces are established. These interfaces repeat the interaction process, continuing until all the reactant is depleted. Thus, the interaction kinetics consist of a sequence of associated parabolic stages, precluding the observation of parabolic kinetics.
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