Self-cleaning activity of CuO/ZnO heterostructure: A synergy of photocatalysis and hydrophilicity

光催化 异质结 材料科学 X射线光电子能谱 接触角 化学工程 氧化物 半导体 润湿 纳米技术 催化作用 光电子学 复合材料 化学 冶金 有机化学 工程类
作者
Diliraj Upadhaya,Debarun Dhar Purkayastha
出处
期刊:Journal of The Taiwan Institute of Chemical Engineers [Elsevier]
卷期号:132: 104216-104216 被引量:41
标识
DOI:10.1016/j.jtice.2022.104216
摘要

Self-cleaning surface using metal oxide semiconductors has gained considerable attention for their unique properties and practical applications. The self-cleaning performance was realized using photocatalytic hydrophilic material where UV irradiation breaks down the pollutants and hydrophilicity sweeps them away. CuO, ZnO and CuO/ZnO thin films were prepared by sol-gel spin coating method. The self-cleaning activity is evaluated through the degradation of organic pollutants from the surface. Herein, we report a successful preparation of an active, CuO/ZnO heterostructure photocatalyst for self-cleaning applications. XRD and TEM analysis confirms the formation of heterostructure between CuO and ZnO. XPS analysis confirms the +2 oxidation state of zinc and copper in the samples. Contact angle studies show the hydrophilicity of CuO/ZnO heterostructure. The photocatalytic activity of CuO/ZnO heterostructure is significantly higher than that of single-phase CuO and ZnO. The enhancement in photocatalytic activity is attributed to the effective separation of charge carriers due to the formation of the heterostructure. The self-cleaning activity is evaluated by the decomposition of octadecanoic acid measured through the change in contact angle values and FT-IR. This research will provide a promising approach in designing a heterostructured photocatalytic system for its potential in self-cleaning applications.
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