Nanotextured super-hydrophobic transparent poly(methyl methacrylate) surfaces using high-density plasma processing

材料科学 表面光洁度 表面粗糙度 接触角 甲基丙烯酸甲酯 等离子体 等离子体刻蚀 复合材料 甲基丙烯酸酯 化学工程 分析化学(期刊) 纳米技术 蚀刻(微加工) 聚合 有机化学 聚合物 图层(电子) 化学 工程类 物理 量子力学
作者
N. Vourdas,Vassilios Constantoudis,Εvangelos Gogolides
出处
期刊:Nanotechnology [IOP Publishing]
卷期号:18 (12): 125304-125304 被引量:150
标识
DOI:10.1088/0957-4484/18/12/125304
摘要

We present an environmentally friendly, rapid, no-rinse and mass-production amenable plasma process for the fabrication of super-hydrophobic (SH) poly(methyl methacrylate) (PMMA) surfaces using only a one load/unload step in a low-pressure, high-density plasma reactor. First, oxygen plasma is applied to nanotexture the PMMA surface via etching processes leading to high aspect ratio (HAR) topography, with dual-roughness characteristics for short process durations, as evidenced by AFM analysis. The duration of the process may range from 1 min to several min depending on the roughness amplitude and on the degree of transparency desired. The significance of the ion-bombardment is revealed and discussed. After this first step, the gas chemistry is changed to a fluorocarbon one which leads to a few nanometres-thick Teflon-like film deposition, thus altering the PMMA surface chemistry within a few seconds. Following this process, a very large area (depending on the reactor scale) of the PMMA may become SH in less than 1.5 min (total process duration) with a transparency as desired (from fully transparent to milky and antireflective). The contact angles (CA) measured are approximately 152° with 5° hysteresis. For short process durations, the dual-roughness character of PMMA surfaces favours the SH formation, despite the low roughness factor. Furthermore, the dry and low-temperature character of the process ensures the intactness of PMMA's shape and bulk mechanical properties.

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