极紫外光刻
极端紫外线
离解(化学)
激进的
光离子化
氢
锡
激光器
化学
电离
原子物理学
等离子体
紫外线
光化学
材料科学
光学
光电子学
离子
物理
核物理学
有机化学
物理化学
作者
James Edward Hernandez,Nozomi Tanaka,Ryuya Yamada,Yubo Wang,Katsunobu Nishihara,T. Johzaki,Atsushi Sunahara,Kyung Sik Kang,Shinji Ueyama,Ken Ozawa,Shinsuke Fujioka
摘要
One of the critical issues in lithography using extreme ultraviolet (EUV) light is tin contamination of the EUV collector mirrors in the tin-based LPP-EUV light source. The contamination can be removed by the reaction of tin atoms with hydrogen radicals producing stannane (SnH4), which is gaseous at the normal temperature. Hydrogen radicals can be produced from hydrogen molecules through photo-dissociation and photo-ionization induced by broadband radiation emitted from the EUV light source. In this work, an efficient production of hydrogen radical using vacuum ultraviolet (VUV) light emitted from laser-produced high-Z plasma is experimentally demonstrated. A two-dimensional radiation hydrodynamic simulation, coupled with photoionization and photo-dissociation cross sections, also shows the efficient hydrogen radical production by increased VUV light emission, as observed in the experiment.
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