佩多:嘘
材料科学
导电聚合物
纳米技术
薄脆饼
基质(水族馆)
化学工程
聚合物
水溶液
复合材料
图层(电子)
有机化学
海洋学
地质学
工程类
化学
作者
Tae Geun Kim,Su Ryong Ha,Hyosung Choi,Kyungchan Uh,Umesha Kundapur,Soomin Park,Chan Woo Lee,Sang Hwa Lee,Jaeyong Kim,Jong‐Man Kim
标识
DOI:10.1021/acsami.7b04284
摘要
Owing to its high conductivity, solution processability, mechanical flexibility, and transparency, poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) has been extensively explored for use in functional devices including solar cells, sensors, light-emitting diodes, and supercapacitors. The ability to fabricate patterned PEDOT:PSS on a solid substrate is of significant importance to develop practical applications of this conducting polymer. Herein, we describe a new approach to obtain PEDOT:PSS patterns that are based on a polymerizable supramolecular concept. Specifically, we found that UV irradiation of a photopolymerizable diacetylene containing PEDOT:PSS film followed by development in deionized water and subsequent treatment with sulfuric acid (glass and silicon wafer) or formic acid (PET) produces micron-sized PEDOT:PSS patterns on solid substrates. The newly designed photolithographic method, which can be employed to generate highly conductive (>1000 S/cm) PEDOT:PSS patterns, has many advantages including the use of aqueous process conditions, a reduced number of process steps, and no requirement for plasma etching procedures.
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