Z* Code for DPP and LPP Source Modeling

编码(集合论) 计算机科学 源代码
作者
S. V. Zakharov,Vladimir G. Novikov,Peter Choi
出处
期刊:SPIE eBooks [SPIE]
卷期号:: 223-276 被引量:13
标识
DOI:10.1117/3.613774.ch8
摘要

An EUV source is a critical component for the industrial extension of EUVL to feature sizes of 45 nm and beyond. In the ITRS road map, the current specification requires an EUV source capable of producing inband radiation at 13.5 nm in excess of 115 W collectable over a 2% bandwidth at the intermediate focus (IF). This calls for extreme plasma parameters of unprecedented radiation efficiency. DPPs, such as the hollow-cathode-triggered (HCT) Z-pinch, capillary discharge, and dense plasma focus (DPF), and also LPPs, are considered as possible candidates for the creation of a compact EUV radiation source. In plasma discharges, low-Z materials such as Li (Z = 3) or various high-Z materials such as Sn (Z = 50), In (Z = 49), or the gases Kr (Z = 36) and Xe (Z = 54), for instance, are considered for the generation of EUV radiation. The 5p-4f transitions in xenon ions Xe XI and 4d-4f resonances of a set of tin ions Xe V–XIV emit intensely in the 1.5-nm 2%-bandwidth spectral band. Knowledge of the behavior of discharge plasmas with low- and high-Z elements is critical for the study of DPP or LPP and is of vital importance in the design of EUV sources. A suitable source of radiation in the case of a high-Z radiator is the radiating multicharged ion plasma heated up to tens of electron volts. In such sources the complicated atomic and plasma physics, the nonstationary, nonequilibrium ionization process, and the radiation transport and plasma dynamics with self-consistent electromagnetic field (for discharge plasmas) interact strongly with each other. In a DPP plasma, heating is effected through several physical mechanisms: Joule dissipation; viscous kinetic energy dissipation, driven by the magnetic j × B force, in compression waves; and P d V work of the preheated plasma. The energy deposition in the discharge often exceeds 10 keV per ion to create the highly charged ion plasma. The ionization degree may reach 10 or higher. A significant part of the deposited energy is radiated. Radiation may be partially trapped, especially in the most intense lines. Optical properties and the plasma equation of state (EOS) are, as a rule, in conditions far from local thermodynamic equilibrium (LTE), i.e., in a non-LTE state.

科研通智能强力驱动
Strongly Powered by AbleSci AI
科研通是完全免费的文献互助平台,具备全网最快的应助速度,最高的求助完成率。 对每一个文献求助,科研通都将尽心尽力,给求助人一个满意的交代。
实时播报
量子星尘发布了新的文献求助10
刚刚
调皮惜天发布了新的文献求助10
1秒前
2秒前
刘芋叶完成签到,获得积分10
2秒前
Luna完成签到,获得积分20
3秒前
CipherSage应助我不吃牛肉采纳,获得10
3秒前
专注白昼发布了新的文献求助10
3秒前
4秒前
4秒前
4秒前
kk子发布了新的文献求助10
4秒前
许子峻完成签到,获得积分10
5秒前
所所应助kido采纳,获得10
5秒前
5秒前
6秒前
友好的背包完成签到,获得积分10
6秒前
6秒前
Tingshan发布了新的文献求助10
7秒前
量子星尘发布了新的文献求助10
7秒前
Jankin发布了新的文献求助10
8秒前
海风发布了新的文献求助10
8秒前
慕青应助mo采纳,获得10
8秒前
8秒前
9秒前
汉堡包应助甜蜜的马里奥采纳,获得10
9秒前
9秒前
pancake发布了新的文献求助10
9秒前
Wuxiaolu发布了新的文献求助10
9秒前
思源应助夜雨采纳,获得10
10秒前
风清扬发布了新的文献求助10
12秒前
makbaka发布了新的文献求助10
12秒前
12秒前
luming完成签到 ,获得积分10
13秒前
生动谷蓝完成签到,获得积分10
14秒前
14秒前
小二郎应助石榴汁的书采纳,获得10
15秒前
Tree_QD完成签到 ,获得积分10
15秒前
握不住的沙完成签到,获得积分10
17秒前
Bill Wang完成签到,获得积分10
17秒前
18秒前
高分求助中
2025-2031全球及中国金刚石触媒粉行业研究及十五五规划分析报告 40000
(应助此贴封号)【重要!!请各用户(尤其是新用户)详细阅读】【科研通的精品贴汇总】 10000
Introduction to strong mixing conditions volume 1-3 5000
Ägyptische Geschichte der 21.–30. Dynastie 2500
Clinical Microbiology Procedures Handbook, Multi-Volume, 5th Edition 2000
„Semitische Wissenschaften“? 1510
从k到英国情人 1500
热门求助领域 (近24小时)
化学 材料科学 生物 医学 工程类 计算机科学 有机化学 物理 生物化学 纳米技术 复合材料 内科学 化学工程 人工智能 催化作用 遗传学 数学 基因 量子力学 物理化学
热门帖子
关注 科研通微信公众号,转发送积分 5743323
求助须知:如何正确求助?哪些是违规求助? 5413456
关于积分的说明 15347310
捐赠科研通 4884139
什么是DOI,文献DOI怎么找? 2625595
邀请新用户注册赠送积分活动 1574486
关于科研通互助平台的介绍 1531380