X射线光电子能谱
材料科学
锡
图层(电子)
溅射
氢氧化物
分析化学(期刊)
氧化物
冶金
化学
纳米技术
化学工程
无机化学
薄膜
色谱法
工程类
作者
Petra Keller,Hans‐Henning Strehblow
标识
DOI:10.1524/zpch.2005.219.11.1481
摘要
Passive layers on tin, CuSn4 and CuSn19 were prepared in 0.1 N KOH (pH 12.5) under potentiostatic control with systematic variation of the relevant parameters, such as potential and time, and examined by X-ray photoelectron spectroscopy. XPS studies of potentiostatically polarised Sn-electrodes show the linear growth of the oxide layer thickness with increasing potential. Angular resolved-XPS measurements and XPS-depth-profiles allow the development of a model of the passive layer: In the passive potential range it consists mainly of SnO2 with a small contribution of SnO. Tin hydroxide was found only on top of the layer. Sputter profiles indicate a dominating SnO2 part which increases with the potential and the passivating time. SnO was detected underneath a layer of SnO2 with a thickness constant with potential.
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