选区衍射
单层
透射电子显微镜
材料科学
倾斜(摄像机)
扫描透射电子显微镜
区域轴
电子衍射
暗场显微术
高分辨率透射电子显微镜
氮化硼
衍射
分析化学(期刊)
光学
显微镜
化学
纳米技术
物理
机械工程
色谱法
工程类
作者
Michael L. Odlyzko,K. Andre Mkhoyan
标识
DOI:10.1017/s143192761200013x
摘要
Abstract Multislice simulations in the transmission electron microscope (TEM) were used to examine changes in annular-dark-field scanning TEM (ADF-STEM) images, conventional bright-field TEM (BF-CTEM) images, and selected-area electron diffraction (SAED) patterns as atomically thin hexagonal boron nitride (h-BN) samples are tilted up to 500 mrad off of the [0001] zone axis. For monolayer h-BN the contrast of ADF-STEM images and SAED patterns does not change with tilt in this range, while the contrast of BF-CTEM images does change; h-BN multilayer contrast varies strongly with tilt for ADF-STEM imaging, BF-CTEM imaging, and SAED. These results indicate that tilt series analysis in ADF-STEM image mode or SAED mode should permit identification of h-BN monolayers from raw TEM data as well as from quantitative post-processing.
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