化学吸附
X射线光电子能谱
化学
卤素
紫外光电子能谱
原子轨道
费米能级
吸附
价(化学)
紫外线
无机化学
分析化学(期刊)
光化学
电子结构
物理化学
材料科学
计算化学
核磁共振
物理
有机化学
电子
量子力学
光电子学
烷基
作者
L. J. Gerenser,R. C. Baetzold
标识
DOI:10.1016/0039-6028(80)90390-8
摘要
Ultraviolet photoelectron spectroscopy (UPS) was used to study the chemisorption of halogens on stepped [3(111) × (100)] and low-index (111) silver surfaces. The initial rate of halogen adsorption using CHCl3 exposure on the silver stepped surface is approximately twice that on the low-index surface. This indicates that steps play an important role in chemisorption even on metals with a low density of states at the Fermi level. The adsorbate-induced levels on silver were correlated with halogen p valence orbitals using model extended Hückel calculations. Changes in the silver d band are interpreted as due to p−d orbital interactions.
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