硅
材料科学
图层(电子)
平面的
光学涂层
涂层
光电子学
防反射涂料
氧化物
反射(计算机编程)
晶体硅
光学
纳米技术
冶金
计算机科学
计算机图形学(图像)
物理
程序设计语言
作者
Jianhua Zhao,Martin A. Green
摘要
Antireflection coatings for silicon solar cells have been optimized both theoretically and experimentally for a range of possible situations, such as single-layer and double-layer coatings, and on planar and microgrooved surfaces. The effect of a thin passivating silicon dioxide layer under the coating was also considered. A critical passivating oxide thickness of about 300 AA was found to be important for the design of these coatings. A new half-quarter-wavelength double layer antireflection coating can be achieved with very low reflection if the passivating oxide has to be thicker than this critical thickness.< >
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