期刊:IEEE Electron Device Letters [Institute of Electrical and Electronics Engineers] 日期:2018-04-25卷期号:39 (6): 869-872被引量:268
标识
DOI:10.1109/led.2018.2830184
摘要
High-voltage vertical Ga 2 O 3 MISFETs are developed employing halide vapor phase epitaxial (HVPE) layers on bulk Ga 2 O 3 (001) substrates. The low charge concentration of ~10 16 cm -3 in the n-drift region allows three terminal breakdown voltages to reach up to 1057 V without field plates. The devices operate in the enhancement mode (E-mode) with a threshold voltage of ~1.2-2.2 V, a current ON/OFF ratio of ~10 8 , an ON resistance of ~13-18 mΩ·cm 2 , and an output current of >300 A/cm 2 . This is the first report of high-voltage vertical Ga 2 O 3 transistors with E-mode operation, a significant milestone toward realizing Ga 2 O 3 based power electronics.