沉浸式(数学)
抵抗
材料科学
浸没式光刻
渗透(战争)
扫描仪
浸出(土壤学)
复合材料
光学
环境科学
物理
土壤科学
土壤水分
工程类
运筹学
纯数学
图层(电子)
数学
作者
Bob Streefkerk,Jan Mulkens,R. Moerman,Marco Stavenga,J van der Hoeven,Cedric Grouwstra,Richard Bruls,Martijn Leenders,S. Wang,Youri van Dommelen,M. Boerema,Henri Jansen,K. D. Cummings,M. Riepen,H.B.K. Boom,M. B. Suddendorf,Peter Huisman
摘要
This paper discusses the types and formation of immersion defects. It is shown that drying stains and water marks are the main immersion defects. The immersion defects are related to resist leaching, water penetration and droplet formation. It is shown that scanner immersion hood design based on an actuated air gap and air curtain droplet clean-up minimizes defect counts. Additionally, pre-and post soaks steps in the track can reduce drying stains and water marks. The defect performance is evaluated on XT:1250i and XT:1400i systems. It is shown that the immersion defect density can go as low as 0.01 /cm2, which is well below the ITRS 2005 number of 0.03 /cm2.
科研通智能强力驱动
Strongly Powered by AbleSci AI