X射线光电子能谱
材料科学
铒
氧气
退火(玻璃)
氧化物
氢氧化物
分析化学(期刊)
价(化学)
基质(水族馆)
化学工程
无机化学
冶金
化学
光电子学
兴奋剂
海洋学
有机化学
色谱法
工程类
地质学
作者
N. Guerfi,O. Bourbia,S. Achour
出处
期刊:Materials Science Forum
日期:2005-03-01
卷期号:480-481: 193-196
被引量:17
标识
DOI:10.4028/www.scientific.net/msf.480-481.193
摘要
X-ray and UV photoelectron spectroscopy (XPS and UPS were used for studying the oxidation of Er films deposited on Ta substrate under ultra-high vacuum.Oxidation has been carried out at room temperatue with an oxygen pressure of 2x10-5 mbar.Erbium exposition to oxygen produces ; Er2O3 and a hydoxide.Subjecting the sample to a post annealing treatment at 750 °C dissociates the hydroxide and produces additional Er2O3.UPS and XPS valence band gives evidence that the formed oxide is Er2O3.
科研通智能强力驱动
Strongly Powered by AbleSci AI