Growth properties of carbon nanowalls on glass substrates by a microwave plasma-enhanced chemical vapor deposition

In this study, we investigated the low-temperature growth process of carbon nanowalls (CNWs). A microwave plasma-enhanced chemical vapor deposition (PECVD) system was used to grow CNWs on Si and glass substrates using methane (CH4) and hydrogen (H2) gases. CNWs were synthesized at a substrate temperature of 500 °C, and their growth properties depending on their growth time were examined. The vertical and surficial conditions of the grown CNWs depending on the growth temperature were characterized via field-emission scanning electron microscopy (FE-SEM), and the Raman spectroscopy measurements showed structural variations. The optical properties of the CNWs that were synthesized on the glass substrate were analyzed using UV–vis spectroscopy, and it was found that the light transmittance was affected by the form and shape of the CNWs. Energy dispersive spectroscopy (EDS) showed that the CNWs consisted solely of carbon.