Micropatterns Fabricated by Photodimerization‐Induced Diffusion

Abstract Pattern technology plays an important role in the generation of microstructures with different functionalities and morphologies. In this report, a straightforward and versatile strategy is presented for spatially regulating the growth of a microstructure on a surface by the photodimerization of maleimide (MI). Upon exposure of ultraviolet (UV) light, photodimerization of MI in a film comprising furan‐grafted polymer and bismaleimide (BMI) produces a chemical gradient, which can drive the diffusion of BMI from the unexposed to the exposed region and from the bottom to the surface, resulting in the growth of micropatterns. Sequential crosslinking induced by the Diels–Alder reaction between MI and furan maintains the stability of pattern shape. Theoretical modeling with reaction‐diffusion equations reveal that as photodimerization moves the system far from thermodynamic equilibrium, the formation of a chemical potential gradient requires the redistribution of matter, resulting in the formation of topographies. Directional molecular motion induced by UV light can generate complex morphology, and produce materials with unique optical functions, such as charming‐ordered gratings. This straightforward method of fabricating micropatterns by photodimerization‐induced diffusion is successfully applied to patterned curved surfaces, microfluidic channels and encapsulation of integrated light emitting diode chips.