排水诱导屏障降低
信道长度调制
MOSFET
泊松方程
阈下传导
电容
材料科学
静电学
阈值电压
凝聚态物理
电压
晶体管
物理
量子力学
电极
标识
DOI:10.1109/ted.2017.2706182
摘要
A simple model of negative capacitance (NC) MOSFETs is presented. The model treats 2-D electrostatic effects, and the ballistic to diffusive transport regimes. It shows quantitative agreement with numerical device simulations based on a self-consistent solution of the Poisson equation and quantum transport equation based on nonequilibrium Green's function formalism, for an NC MOSFET structure without an internal floating gate. The model can accurately describe the reverse drain-induced barrier lowering (DIBL) and negative output differential conductance (NDC) effects as the NC FETs scale down. With approximations valid at low power supply voltages, it is shown that the improvement of the subthreshold swing (SS) due to electrostatic short channel effects results in a linear increase of the reverse DIBL and NDC. For a modified NC MOSFET structure with an ultrathin quantum metallic layer contacted to the source, the SS, however, can be improved considerably with the reverse DIBL and NDC approximately unchanged.
科研通智能强力驱动
Strongly Powered by AbleSci AI