Hydride Formation and Decomposition on Cu(111) in HClO4

Cu electrodeposition and the electrocatalysis of hydrogenation reactions thereupon involve significant interactions with adsorbed hydrogen. Electrochemical mass spectrometry (EC-MS) is used to explore the formation and decomposition of surface hydride on Cu(111) in 0.1 mol L-1 HClO4. Hydride formation is associated with two reduction waves that reflect the potential-dependent Hads coverage and its reconstruction. Voltammetric cycling reveals an additional oxidative and reductive feature at ≈ -0.05 V versus the reversible hydrogen electrode (RHE) that reflects the state of the 2D surface hydride. Extending the voltammetric window to more negative potentials results in an increase in Hads coverage and surface reconstruction that subsequently leads to accelerated hydride decomposition at positive potentials. Voltammetric and chronoamperometric analysis of hydride formation indicates a Hads coverage of ≈0.75 monolayers (ML) between -0.225 V vs RHE and -0.275 V vs RHE with further increases in Hads observed with the onset and acceleration of the HER at more negative potentials. Returning to more positive potentials, hydride decomposition begins above -0.05 V vs RHE. Recombination of Hads to form H2 accounts for desorption of ≈0.5 ML of Hads while its oxidation to H3O+ consumes between ≈0.15 and ≈0.4 ML of Hads, depending on the specific electrochemical conditions. The potential-dependent Hads coverage and surface reconstruction are congruent with trends identified in recent computational and electrochemical scanning tunneling microscopy studies. In contrast to perchloric acid, the presence of strongly adsorbing anions, such as sulfate or halides, favors hydride decomposition via the recombination pathway.