Impact of Defects and Disorder on the Stability of Ta3N5 Photoanodes

Abstract The photoelectrochemical performance of Ta 3 N 5 photoanodes is strongly impacted by the presence of shallow and deep defects within the bandgap. However, the role of such states in defining stability under operational conditions is not well understood. Here, a highly controllable synthesis approach is used to create homogenous Ta 3 N 5 thin films with tailored defect concentrations to establish the relationship between atomic‐scale point defects and macroscale stability. Reduced oxygen contents increase long‐range structural order but lead to high concentrations of deep‐level states, while higher oxygen contents result in reduced structural order but beneficially passivate deep‐level defects. Despite the different defect properties, the synthesized photoelectrodes degrade similarly under water oxidation conditions due to the formation of a surface oxide layer that blocks interfacial hole injection and accelerates charge recombination. In contrast, under ferrocyanide oxidation conditions, it is found that Ta 3 N 5 films with high oxygen concentrations exhibit long‐term stability, whereas those possessing lower oxygen contents and higher deep‐level defect concentrations rapidly degrade. These results indicate that deep‐level defects result in rapid trapping of photocarriers and surface oxidation but that shallow oxygen donors can be introduced into Ta 3 N 5 to enable kinetic stabilization of the interface.