Conversion of Silanes Into SiC by RF Plasma Technology

Abstract This paper reports on the synthesis of SiC material through the decomposition of silanes in a thermal high frequency (HF) plasma. The process is based on thermal plasma technology for chemical deposition from the gas phase and on suspension plasma spray technology, in which a liquid or suspension is injected axially and atomized in the plasma flame. The liquid silane then decomposes, and forms SiC with some gaseous by-products such as HCl. Various plasma parameters were varied, for example the plasma power level, the plasma gas composition, the chamber pressure, and the silane composition. The paper also presents first investigations into the elementary and phase composition as well as the morphology of the powders and coatings. Paper includes a German-language abstract.