钝化
材料科学
硅
晶体硅
氧化物
光电子学
图层(电子)
氧化硅
纳米技术
冶金
氮化硅
作者
Maria Angelica M Garcia,William Weigand,Zachary C. Holman
标识
DOI:10.1109/pvsc48320.2023.10359748
摘要
Tunnel oxide passivated contacts (TOPCon) have become an increasingly popular contact choice for use in silicon solar cells due to their carrier-selective capabilities and success in creating high-efficiency devices. TOPCon structures, fabricated using a thin silicon oxide (SiOx) passivation layer topped with a layer of doped polysilicon (poly-Si) have enabled cell efficiencies higher than 25%. In this work, we explore the use of a TOPCon rear contact-paired with a standard silicon heterojunction (SHJ) front contact to create hybrid cells-utilizing a novel oxide deposition technique, aerosol-impaction-driven assembly (AIDA). The best cells exceed 20% efficiency and are limited by the processing (in)compatibility of the TOPCon and SHJ contacts. Unusually for TOPCon, we find that AIDA oxide layers up to 6 nm thick provide both decent passivation and sufficient conduction pathways to produce cells with >75% fill factor, indicating a non-tunneling conduction mechanism.
科研通智能强力驱动
Strongly Powered by AbleSci AI