锑
材料科学
纳米线
纳米技术
异质结
半导体
制作
数码产品
锑化镓
光电子学
带隙
锑化铟
超晶格
电气工程
工程类
病理
替代医学
医学
作者
SenPo Yip,Lifan Shen,Johnny C. Ho
出处
期刊:Nanotechnology
[IOP Publishing]
日期:2019-03-13
卷期号:30 (20): 202003-202003
被引量:24
标识
DOI:10.1088/1361-6528/aafcce
摘要
The excellent properties of III–V semiconductors make them intriguing candidates for next-generation electronics and optoelectronics. Their nanowire (NW) counterparts further provide interesting geometry and a quantum confinement effect which benefits various applications. Among the many members of all the III–V semiconductors, III-antimonide NWs have attracted significant research interest due to their narrow, direct bandgap and high carrier mobility. However, due to the difficulty of NW fabrication, the development of III-antimonide NWs and their corresponding applications are always a step behind the other III–V semiconductors. Until recent years, because of advances in understanding and fabrication techniques, electronic and optoelectronic devices based on III-antimonide NWs with novel performance have been fabricated. In this review, we will focus on the development of the synthesis of III-antimonide NWs using different techniques and strategies for fine-tuning the crystal structure and composition as well as fabricating their corresponding heterostructures. With such development, the recent progress in the applications of III-antimonide NWs in electronics and optoelectronics is also surveyed. All these discussions provide valuable guidelines for the design of III-antimonide NWs for next-generation device utilization.
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