Scanning Electron Microscopy and X-Ray Microanalysis 4th Edition, Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W.M. Ritchie, John Henry J. Scott, David C. Joy, Springer, 2018, 550 pp. ISBN:978-1-4939-6674-5.

As a classroom student, teaching Professor, and frequent referrer familiar with the Goldstein et al. editions 1–3, the fourth edition of Scanning Electron Microscopy and X-Ray Microanalysis (SEMXM4) sets the new standard for the "Go-To" SEM textbook "Bible." This fourth edition has been completely overhauled and includes new images and page formatting, with fundamental information on how to get the most out of imaging and analyzing samples with excellent examples and case studies. The book starts with a discussion of electron–solid interactions, including the production of secondary electrons, backscattered electrons, and X-rays. The basic instrument is described as well as image formation and interpretation. Special topics on high-resolution imaging, low-voltage SEM, and high-pressure SEM are detailed. A significant portion of the book is dedicated to qualitative and quantitative energy dispersive X-ray spectrometry, and the late Professor Goldstein's indelible mark is embedded in these microanalysis sections. Strategies for analyzing rough samples and particles are given and compositional mapping is discussed. The use of open source software programs is described: NIH ImageJ-FIJI for image processing, and NIST DTSA II for quantitative EDS X-ray microanalysis and EDS spectral simulation. Additional special topics covered include cathodoluminescence, crystallographic analysis in the SEM, and focused ion beam applications combined with SEM and ion microscopy.