单层
空位缺陷
硫族元素
凝聚态物理
过渡金属
材料科学
肖特基势垒
双极扩散
费米能级
肖特基二极管
工作职能
金属
纳米技术
结晶学
化学
物理
光电子学
冶金
电子
二极管
催化作用
量子力学
生物化学
作者
Yuzheng Guo,Dameng Liu,John Robertson
摘要
It is predicted that Schottky barriers of the transition metal dichalcogenides MoSe2, MoTe2, WS2, WSe2, and WTe2 will suffer less from Fermi level pinning by chalcogen vacancies than does MoS2, because their vacancy formation energies are larger. The reduction in vacancy numbers will allow a greater degree of Schottky barrier height tuning by varying metal work function of the contacts in these compounds. The vacancy levels of WS2, WSe2 and MoSe2, and MoTe2 are also calculated to lie nearer midgap, so that ambipolar conduction will be easier in these compounds than in MoS2.
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