材料科学
碳化硅
Crystal(编程语言)
体积热力学
大气温度范围
晶种
晶体生长
电导率
蒸汽压
结晶学
复合材料
单晶
热力学
化学
物理
物理化学
程序设计语言
计算机科学
作者
G. Augustine,H. Mc. D. Hobgood,V. Balakrishna,Greg Dunne,R.H. Hopkins
标识
DOI:10.1002/1521-3951(199707)202:1<137::aid-pssb137>3.0.co;2-y
摘要
The physical vapor transport technique can be employed to fabricate large diameter silicon carbide crystals (up to 50 mm diameter) exhibiting uniform 4H-polytype over the full crystal volume. Crystal growth rate is controlled to first order by temperature conditions and ambient pressure. 4H-polytype uniformity is controlled by polarity of the seed crystal and the growth temperature. 4H-SiC crystals exhibit crystalline defects mainly in the form of dislocations with densities in the 104 cm—2 range and micropipe defects, the latter having densities as low as 10 cm—2 in best crystals. Electrical conductivity in 4H-SiC bulk crystals ranges from <10—2 Ω cm, n-type, to insulating (>1015 Ω cm) at room temperature.
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