Design, fabrication and characterization of multilayer Cr-CrN thin coatings with tailored residual stress profiles

残余应力 材料科学 刮擦 复合材料 压力(语言学) 薄膜 涂层 溅射沉积 成核 纳米压痕 物理气相沉积 锥面 溅射 纳米技术 哲学 有机化学 化学 语言学
作者
Marco Renzelli,Muhammad Zeeshan Mughal,Marco Sebastiani,Edoardo Bemporad
出处
期刊:Materials & Design [Elsevier]
卷期号:112: 162-171 被引量:42
标识
DOI:10.1016/j.matdes.2016.09.058
摘要

Compressive residual stress in hard coatings can improve adhesion and in-service toughness, since they can inhibit crack nucleation and propagation. However, the role of through thickness residual stress profile is not fully understood. This is because of (a) lack of knowledge of stress evolution mechanisms and (b) limitations of experimental techniques used for stress profiling. The present work deals with design, deposition and characterization of Cr-CrN multilayer coatings, produced by Magnetron Sputtering Physical Vapour Deposition (MS-PVD), with the purpose to understand the effect of through thickness residual stress profile on coating adhesion. An automated optimisation algorithm was used to determine the desired residual stress through-thickness profile for a range of contact loading situations. On the basis of modelling activities, three different Cr-CrN multilayers were produced, with the aim of obtaining different stress gradients, as measured by incremental micro-scale focused ion beam (FIB) ring-core method, while keeping the same average stress value and same average hardness in the film. Results show a significant correlation between the observed residual stress profiles and scratch adhesion, where different optimal stress profiles are identified for different loading conditions. This is a major step with respect to previous literature, where scratch adhesion in hard coatings was only correlated to the average stress in the film, but not to the stress gradient within the film thickness. Here, we show that a lower interfacial compressive stress and a reduced through thickness stress gradient gives improved scratch adhesion, when using 10 μm and 200 μm sphero-conical indenters.
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