JFET公司
材料科学
光电子学
MOSFET
外延
击穿电压
高压
电压
电气工程
纳米技术
场效应晶体管
晶体管
图层(电子)
工程类
作者
Takashi Tsuji,Hiromu Shiomi,Naoyuki Ohse,Yasuhiko Ōnishi,Kenji Fukuda
出处
期刊:Materials Science Forum
日期:2016-05-24
卷期号:858: 962-965
被引量:6
标识
DOI:10.4028/www.scientific.net/msf.858.962
摘要
In this paper, newly developed 3300V-class IEMOSFETs were presented. By means of the optimization of current spreading layers (CSLs), we could achieve low specific on-resistance (R ON A) of 11.6mΩcm 2 , while maintaining high blocking voltage (BV DSS ) of 3978V. The R ON A analysis revealed drastic reduction of JFET resistance compared to a MOSFET without a CSL. High ruggedness with the avalanche withstanding energy of 4.6J/cm 2 was achieved by the optimal device design of the edge termination. We could also confirm favorable characteristics of R ON A, BV DSS and threshold voltage (V TH ) at high temperatures up to 200 ○ C, and the fast switching behavior.
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