催化作用
空位缺陷
加氢脱氧
活化能
材料科学
选择性
硫黄
光化学
金属
Atom(片上系统)
化学
化学物理
化学工程
结晶学
物理化学
有机化学
冶金
嵌入式系统
工程类
计算机科学
作者
Qiang Li,Xiaowan Bai,Chongyi Ling,Qionghua Zhou,Shijun Yuan,Qian Chen,Jinlan Wang
标识
DOI:10.1002/smtd.201800315
摘要
Abstract Atomically dispersed supported catalysts show superior catalytic activity and selectivity in diverse reactions, while the challenging part is identifying the active sites and revealing the reaction mechanisms, which play essential roles in rational design of efficient catalysts to massive energy consumption reduction. Herein, an atom vacancy interface (AVI) model is proposed, for the first time, based on a case study of atomically dispersed Co atoms distributed on 2H‐MoS 2 surfaces as promising catalysts for hydrodeoxygenation (HDO) reactions. The results show that the reactive single Co atom promotes the H 2 activation and leads to largely increased sulfur vacancies adjacent to the metals and the formation of metal vacancy interfaces on the MoS 2 surface. Detailed reaction mechanism studies demonstrate that the AVI model is quite different from edge vacancy dominated unprompted MoS 2 and traditionally prepared CoMoS 2 catalysts. The novel structure results in a considerable reduction of energy barriers of three elementary steps including CO scission, hydrogenation processes, and catalytic center regeneration, and eventually boots the HDO reaction at low temperature.
科研通智能强力驱动
Strongly Powered by AbleSci AI