Enhancing the adhesion and tribological performance of Si-DLC film on NBR by Ar plasma pretreatment under a high bias

摩擦学 材料科学 粘附 类金刚石碳 基质(水族馆) 溅射沉积 复合材料 图层(电子) X射线光电子能谱 表面粗糙度 表面改性 碳纤维 傅里叶变换红外光谱 溅射 化学工程 纳米技术 薄膜 冶金 复合数 工程类 地质学 海洋学
作者
Li Qiang,Changning Bai,Aimin Liang,Junyan Zhang
出处
期刊:AIP Advances [American Institute of Physics]
卷期号:9 (1) 被引量:10
标识
DOI:10.1063/1.5063365
摘要

Silicon-containing diamond-like carbon (Si-DLC) films were successfully deposited on nitrile-butadiene rubber (NBR) via magnetron sputtering Si target in Ar and CH4 mixture atmosphere. The influence of Ar plasma pretreatment bias on the adhesion and tribological properties of the Si-DLC coated NBR were investigated systematically. The results indicated that the surface roughness of NBR substrate decreased monotonously with the increase of bias. Compared with the virgin NBR, the surface topography did not change significantly under a low bias, but a shallow layer and considerable chain scission could be observed by SEM and FTIR analysis under a high bias. As a consequence, the excellent adhesion could be obtained by Ar plasma pretreatment under a high bias (>-500 V), while the adhesion of the samples pretreated by a low bias (≤-500 V) were even worse than that of untreated samples. Furthermore, the samples pretreated at a relatively high bias of -1000 V exhibited the lowest and stable friction coefficient of 0.25 and outstanding wear resistance, while the tribological performance of the samples pretreated with a low bias (≤-500V) were even worse than that of untreated ones. The research results of this work are of great surface engineering significance for the design and fabrication of hard films with a high adhesion and excellent tribological performance on rubber substrates.

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